Water Analysis in Semiconductor & Microelectronics
In the semiconductor industry numerous processes need ultra pure water for their operation. Any disturbance in water quality may lead to a cost intensive plant shut down – this should be avoided. Therefore, continuous and fast water analysis is required to meet the high quality standards set.
In the semiconductor and microelectronics industries, the high quality and purity requirements for product and process safety are met by accurate and reliable on-line TOC monitoring in the lowest levels.
Ultra pure water is prepared under particularly strin-gent specifications. It is a matter of ensuring purity in respect of all types of contaminants: organic/inorganic compounds, dissolved/solid or volatile/non-volatile components, dissolved gases, reactive/inert substances etc. Depending on the respective application, require-ments regarding UPW purity are defined in norms such as ASTM D5127 and SEMI F63.
Ultra-pure water (UPW) is primarily used in the manufacture of semiconductors and microelectronics. It is used inter alia in the
- rinsing of wafers
- the dilution of chemicals
- and in optical systems in photolithography
Regular chemical and/or steam-based cleaning processes (pharma), as well as ultrafiltration (semi-conductors), ozonation and general optimizing of duct systems can minimize impurities. The effectiveness of cleaning processes and the quality of the UPW used are subject to monitoring through TOC analyses and conductivity measurements.
The primary and critical application of UPW is front-end cleaning in the manufacture of integrated circuit boards.
Potential sources of contaminants can include:
- Sources of contaminants such as particulate matter, bacteria/biological growth, total organic matter (TOC), and inorganic components are feed water and make-up water used in the production of ultra-pure water.
- Distribution systems, in turn, can be a source of contamination, as can additives and purification processes.
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